A*STAR Institute of Microelectronics (IME)
and Picosun Oy, a Finland-based global manufacturer of Atomic Layer Deposition
(ALD) equipment, have announced a partnership to develop advanced ALD
techniques in next generation memories and solar cells.
With
this collaboration, IME and Picosun will jointly develop innovative ALD and
plasma-enhanced ALD (PEALD) processes for novel dielectrics and metals for
applications in resistive switching non-volatile memories (NVM), multilayer
metal-insulator-metal (MIM) capacitors, solar cells, and advanced
complementary-metal-oxide-semiconductors (CMOS).
“IME is
continually engaging with strategic partners to enable breakthroughs in novel
technologies,” says Prof. Dim-Lee Kwong, Executive Director of IME.
“Picosun’s
state-of-the-art ALD technology and unparalleled expertise in the field will
complement our expertise to spearhead new technologies and bring the results of
our R&D to our partners rapidly.”
Enabling
integration of the processes with the devices for industrial applications will
be the core objective of the joint research project.
“We are
excited to partner with IME to speed up the R&D of novel, groundbreaking
semiconductor, IC and renewable energy technologies. Establishing the
IME-Picosun partnership ties closely also to the recent opening of Picosun’s
first Asian subsidiary, Picosun Asia Pte. Ltd. in Singapore,” said Mr. Kustaa
Poutiainen, CEO of Picosun.
AsianScientist
Source: A*STAR.
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